UNIX 223 P3 R D particle filter
Three manufacturers — Sorbent JSC, Tambovmash JSC, EHMZ named after N. D. Zelins...
Please sign in so that we can notify you about a reply
Purpose
Particle filter UNIX 223 P3 R D with additional protection from organic gases and vapors up to 1 PEL is used as part of UNIX filtering masks or respirators with an oxygen content of at least 17% by volume.
Filters are used with full face masks UNIX 5000, UNIX 5100, UNIX 6100 and half masks UNIX 1000, UNIX 1100, UNIX 2100. The filter easily attaches to the facepiece with a bayonet connection. It is resistant to dust (D), reusable (R) and belongs to high efficiency filters (P3).
Compliance with regulations
Particle filter UNIX 223 P3 R D complies with the requirements of the European standard EN 143.
No reviews found